Improvement of corrosion resistance and mechanism analysis for self-assembled vinyltriethoxysilane (VS) films on low carbon steel using a novel chemical etching method
By Yang, Li-Xia; Cao, Xue-Li; Wu, Yun-Tao; Chen, Shuo; Xie, Xiao-Chun; Zhu, Qi-Liang; Wang, Jun-Xia; Qu, Jun-E.; Chen, Sen; Zheng, Peng-Hua
Published in Corrosion Science
2020
Abstract
Vinyltriethoxysilane (VS) films with improved corrosion resistance and uniform thickness (∼2.8 μm) were fabricated on low carbon steel using a novel chemical etching method. The film forming mechanism occurred on the etched metal was investigated by experimental and theoretical methods. Results reveal that the metal hydroxylation and micro-rough surface generated in H2O2-containing etchant contribute to the enhancement of interfacial adhesion and protective performance for self-assembled films. However, there is an optimal etching time about 4 min forming denser interfacial layer with high adhesion of grade 1. Prolonged etching will cause inversely deterioration of the formed VS films.